Digital guide
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AMAT 0010-20389
Product Name: 200mm Heater Pedestal Assembly
Product Description: A complete heated wafer support pedestal assembly for 200mm wafer processing. It integrates a resistive heating element, temperature sensor, and mechanical support to provide precise, uniform wafer heating during thin-film deposition and etching.
Detailed content
Technical Specifications:
- Wafer Size: 200mm (8-inch)
- Heating Element: Nichrome / Kanthal resistive heater
- Temperature Range: 50°C to 450°C
- Temperature Uniformity: ±1°C across wafer surface
- Power Rating: 1.2kW, 208V AC
- Material: Aluminum nitride (AlN) / Anodized aluminum
- RTD Sensor: Pt100 for closed-loop control
- Vacuum Compatibility: 10⁻⁸ Torr
Functional Features:
- Ultra-uniform heating for consistent wafer processing
- Fast heat-up and cool-down cycles (≤ 30 sec to target temp)
- Low thermal mass for responsive temperature control
- Hermetically sealed heater element for vacuum service
- Precision-machined surface for optimal wafer contact
Application Scenarios: Wafer heating in 200mm PVD (Endura), CVD (Centura), and dielectric etch chambers for processes including aluminum, copper, and dielectric film deposition.
