Digital guide
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AMAT 0010-10721
- Product Name: 200mm Heater Pedestal Assembly
- Product Description: A high-precision, resistively heated pedestal assembly designed for supporting and uniformly heating 200mm wafers in semiconductor vacuum process chambers.
- Technical Specifications:
- Wafer Compatibility: 200mm (8-inch) wafers.
Detailed content
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- Heating Zones: Dual-zone independent temperature control.
- Wattage: 1.5 kW total power.
- Temperature Range: 100°C to 400°C.
- Uniformity: Temperature variation ±1.0°C across wafer surface.
- Material: Aluminum nitride (AlN) ceramic body with embedded molybdenum heating elements.
- Functional Features:
- Rapid thermal response with precise closed-loop control.
- High thermal conductivity ensuring minimal temperature gradients.
- Hermetically sealed construction to prevent outgassing in high vacuum.
- Integrated thermocouple ports for real-time temperature monitoring.
- Resistant to chemical corrosion from process gases and plasma.
- Application Scenarios: Deployed in PVD (Endura) and CVD (Centura) chambers for processes such as titanium, tantalum, and oxide depositions.
