Detailed content
Technical Specifications:
- Material: 5083 aluminum alloy
- Surface Finish: Hard anodized (internal) to resist plasma corrosion
- Sealing Interface: Accommodates a centering O-ring groove for metal or elastomer seals
- Mounting: Precision-drilled bolt pattern for alignment with chamber body
Functional Features:
- Provides a robust, vacuum-tight seal for the chamber top
- Integrated ports for viewports, gas injectors, or RF feedthroughs
- Low particulate generation design
- Easy to remove for maintenance and chamber cleaning
Application: Used as the top sealing lid on Etch, PVD, and CVD chambers for 200mm and 300mm wafer processing systems.












