AMAT 0010-04542
Product Name: 200mm WXZ Ceramic Ring Heater Assembly
Product Introduction: A high-performance ceramic ring heater assembly designed for 200mm wafer semiconductor process chambers, providing uniform thermal control for wafer processing.
Technical Specifications:
- Wafer Compatibility: 200mm (8-inch) wafer processing systems
Detailed content
- Material: High-purity ceramic with embedded resistive heating elements
- Temperature Range: Up to 450°C for process-compatible thermal control
- Heating Uniformity: ±1% across the entire heated surface
- Integration: Built-in thermocouple for real-time temperature monitoring
- Compatibility: AMAT Centura and Producer series 200mm systems
Functional Features:
- Delivers uniform, stable heating for 200mm wafer processing
- Rapid thermal response for precise process temperature control
- Low outgassing and particle generation for UHV compatibility
- Corrosion resistance to semiconductor process gases and plasmas
- Easy installation and replacement during chamber maintenance
Application Scenarios:
- Wafer heating in 200mm semiconductor CVD and PVD process chambers
- Thermal control component for AMAT Centura and Producer series systems
- Replacement heater assembly for 200mm wafer fabrication equipment
- Critical thermal management for advanced semiconductor processes





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