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AMAT 0010-04542

Product Name: 200mm WXZ Ceramic Ring Heater Assembly

Product Introduction: A high-performance ceramic ring heater assembly designed for 200mm wafer semiconductor process chambers, providing uniform thermal control for wafer processing.

Technical Specifications:

  • Wafer Compatibility: 200mm (8-inch) wafer processing systems

Detailed content

  • Material: High-purity ceramic with embedded resistive heating elements
  • Temperature Range: Up to 450°C for process-compatible thermal control
  • Heating Uniformity: ±1% across the entire heated surface
  • Integration: Built-in thermocouple for real-time temperature monitoring
  • Compatibility: AMAT Centura and Producer series 200mm systems

    Functional Features:

  • Delivers uniform, stable heating for 200mm wafer processing
  • Rapid thermal response for precise process temperature control
  • Low outgassing and particle generation for UHV compatibility
  • Corrosion resistance to semiconductor process gases and plasmas
  • Easy installation and replacement during chamber maintenance

    Application Scenarios:

  • Wafer heating in 200mm semiconductor CVD and PVD process chambers
  • Thermal control component for AMAT Centura and Producer series systems
  • Replacement heater assembly for 200mm wafer fabrication equipment
  • Critical thermal management for advanced semiconductor processes

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