Digital guide
You are here:
AMAT 0010-03171
- Product Name: Quartz Gas Distribution Showerhead
- Product Description: A high-purity fused quartz showerhead for uniform radial distribution of process gases into semiconductor deposition chambers.
- Technical Specifications:
- Material: High-purity fused silica (quartz, >99.99% SiO₂).
Detailed content
-
- Dimensions: 300mm diameter, 15mm thickness.
- Hole Pattern: 200 precision-drilled 0.5mm orifices in concentric rings.
- Surface Finish: Fire-polished, Ra < 0.2 μm.
- Temperature Rating: Up to 1000°C.
- Functional Features:
- Ensures laminar gas flow and uniform film deposition across wafer.
- Exceptional resistance to high-temperature and corrosive process gases.
- Low metallic contamination critical for UHP processes.
- High thermal shock resistance.
- Transparent to infrared for in-situ process monitoring.
- Application Scenarios: Used in PECVD and LPCVD chambers for TEOS oxide, silicon nitride, and poly-silicon deposition processes.
