Digital guide
You are here:
AMAT 0010-01231
Product Name: Ceramic Heater Pedestal / Susceptor Assembly
Product Description: A integrated ceramic heater and wafer support pedestal (susceptor) designed for precise, uniform wafer heating in thermal processing chambers. It combines a heating element with a ceramic support structure.
Technical Specifications:
- Material: Multi-layer high-purity alumina (Al₂O₃) ceramic body.
Detailed content
- Heating Element: Embedded, high-temperature resistant tungsten or molybdenum heating coil.
- Temperature Range: Operating range from 100°C to 600°C.
- Uniformity: Temperature uniformity across the wafer surface of ±1°C.
- Control: Integrated thermocouple (Type K or N) for closed-loop temperature feedback.
Functional Features:
- Delivers rapid, uniform heating with minimal thermal lag.
- Excellent thermal shock resistance to withstand rapid ramping cycles.
- Non-porous ceramic surface prevents particle generation and contamination.
- High dielectric isolation to prevent electrical interference with process plasma.
Application Scenarios:
- Used in thermal CVD, ALD, and Oxidation/Nitridation chambers.
- Serves as a wafer heating pedestal in AMAT Centura and Precision 5000 thermal systems.
